Scanning Electron Microscope (SEM) LYRA3 GMU, company TESCAN with autoemission electron source (Field Emission Gun, FEG) for chemical (EDS, WDS), crystallography (EBSD) and sample preparation of TEM lamellas, litography and nanowelding, nanomachining by focused ion beam (FIB). Microscope for analyses of metallic as well as non-metallic materials in the mode of low vacuum or C, Au coated specimens.

• Electron source: Field Emission Gun (FEG) optimized for high resolution, brightness and electron current
• Accelerating voltage: 0,05 up to 30 kV
• Detectors: SE, BSE, in-lens SE
• In-lens SE detector: resolution 1 nm at 30 kV
• e-Beam deceleration: non-conductive samples
• Ion Gun: Galium Liquid Metal Ion Source
• Chemical analysis: Energy Dispersive (EDX) and Wave Dispersive (WDX) spectrometers
• Crystallography analysis: EBSD detector
• GIS (Gas Injection System) – local deposition of Pt, W, C
• FIB (Focused Ion Beam): TEM lamella preparation, litography, nano-milling